University-Industry Cooperation and Research Program Division,
Research Program Department,
Japan Society for the Promotion of Science (JSPS)
5-3-1 Kojimachi, Chiyoda-ku, Tokyo 102-0083, JAPAN
University-Industry Cooperative Research Committees
Aims and Goals
VLSIs (very large scale integrations), semiconductor lasers, and other semiconductor devices that sustain the 21st century’s sophisticated information society have led to today’s prosperity. These devices were made possible by advances in technologies for growing large, high-quality crystals and technologies for minutely detailed, precise processing and characterization. Today, however, as great advances are being made in terms of speed and integration, numerous difficult issues that cannot be solved with extensions of existing technologies have become apparent. Meanwhile, the development of high performance, low cost solar cells and low-loss power devices in response to environmental and energy issues has become an urgent matter, and innovative crystal growth and processing technologies are eagerly awaited. Academia-industry cooperative efforts based on basic research have become increasingly important in this situation.
To contribute to improvements in silicon and compound semiconductor crystal growth and wafer technologies, this committee develops new processing and characterization technologies while at the same time offering researchers and engineers forums for interaction.
Wafer assessment technology research and development
SOI (silicon-on-insulator) wafer and strained silicon technology research and device applications
Development of new dislocation-free, large diameter crystal growth technologies
Quantification and standardization of methods for characterizing defects in silicon
Solar cell silicon crystal growth and characterization
Wide bandgap semiconductor crystal technologies and device applications
Human resource development through international symposia and research conferences
October 2012 to September 2017 (Eighth term, Five years)