University-Industry Cooperation and Research Program Division,
Research Program Department,
Japan Society for the Promotion of Science (JSPS)
5-3-1 Kojimachi, Chiyoda-ku, Tokyo 102-0083, JAPAN
University-Industry Cooperative Research Committees
Aims and Goals
Charged particle beams consisting of electrons and ions have constantly been in the forefront of advanced technologies for ultrafine processing, materials modification, functional thin films formation, and analytical probes due to their superior controllability. Various industry fields, such as the semiconductor, metal, and polymer fields, have always shown interest in and intense hope for these beams.
With that in mind, researchers in this committee, coming from fields of engineering and physics related to electricity, machinery, chemistry, and materials, have cooperated in carrying out research into basic charged particle beam and device technologies as well as in promoting research into industrial applications, with the goal of contributing to significant advances in related fields.
Research into next-generation lithography technologies
(1) Research into teradots lithography technology with a multi-nano electron beam source
(2) Research into fine ultraviolet and ion beam lithography technology
Research into nanobeam technology
Research into next-generation ion beam applications (development of biocompatible materials, formation of ultrashallow junctions, etc.)
Research into new electron beam optics systems
Activities that contribute to education and international exchange
Tokyo University of Agriculture and Technology