An international workshop (17^th International Workshop on Oxide Electronics: WOE-17) was organized by the 131st Committee on Thin Film of JSPS, during September 19th (Sun.) – 22nd (Fri.), 2010, at the Awaji Yumebutai International Conference Center, Awaji, Hyogo, Japan. The number of participants were 185 [89 from Japan, 96 non-Japanese (15 each from USA, Switzerland, Korea; 6 each from the Netherlands, Germany, Italy, and France; 5 each from Spain, and Taiwan; 3 each from Norway, and UK; 2 from Canada; 1 each from Singapore, India, China, and Israel] and 13 accompanying persons.

Representative participants were J. Fontcuberta (Institut de Ciència de Materials de Barcelona ICMAB CSIC, Spain), J. Junquera (Universidad de Cantabria, Spain), M. Fiebig (University of Bonn, Germany), Y. Dagan (Tel Aviv University, Israel), A. Rusydi (National University of Singapore, Singapore), A. Ruegg (Eidgenössische Technische Hochschule Zürich, Switzerland), C. –B. Eom (University of Wisconsin-Madison, USA), T. Kawai (Osaka University, Japan), H. Koinuma (University of Tokyo, Japan), H. Hosono (Tokyo Institute of Technology, Japan), Y. Tokura (University of Tokyo, Japan), M. Kawasaki (Tohoku University, Japan), Y. Kuroiwa (Hiroshima University, Japan), and many other outstanding researchers.

Total budget was 11,000 kYen including 2,216 kYen as one of the JSPS Symposium Projects.

The statistics and classification of presentations are listed in Table 1.

The 11 invited talks attracted great interest of the participants. Contributed talks and poster presentations concerning strongly correlated systems, wide-gap oxide semiconductors, multiferroics, and oxide heterostructures were all outstanding. Among them, 4 excellent young researchers were awarded the poster prize. A welcome reception and a banquet were held on first and third day of the workshop, respectively.

Thanks are due to those companies supported the workshop through all the sessions or exhibition.

Next WOE will be held in September 2011 in USA.