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In order to investigate atomic structure of surfaces and interface we have developed "Photoelectron Spectro-Hologarphy" method and instrument.
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1. Instrumentation of the multi-energy high power X-ray source
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This apparatus is equipped with three sets of rotating anodes and mirrors for the Al-Kα (hν=1486.8 eV), Cr-Lα (hν=572.8 eV), Cu-Kα (hν=8047.8 eV) excitation, which intensities are about 1010-11 cps.
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2. Development of the high-performance angular resolving photoelectron spectrometer system.
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The novel inputs-lens-system with the diffraction plane aperture realizes high throughputs of the detected electrons even if the angular resolution of 0.04°. High kinetic energy electrons up to 9.5 keV can be also detected with the same angular resolution.
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3. Construction of Photoelectron Spectro-Holography Apparatus and Development of the Three-Dimensional Microanalysis System
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(1) Combination of above two apparatus realizes the novel photoelectron spectro-holography apparatus, which are also equipped with MBE and STM .
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(2) Using a focus ion beam and chemical etching by reactive gases, we have been developing the 3D microanalysis for practical surfaces and interfaces.
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4. Reconstruction of Atomic Images by Photoelectron Holography
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Using photoelectron holograms effectively, Differential Photoelectron Holography reconstructs more precious atomic image than other photoelectron techniques. We also developed tensor XPED and fluorescence X-ray holography.
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5. Applications of Photoelectron Spectro-Holography to model and practical surfaces
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In order elucidate the potential and the validity of "Photoelectron Spectro-Holography" analysis by using this novel instrument, we measured several surfaces and interfaces, such as Zr-O/W(001), h-BN/Ni(111) and Co/Ge(111).
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