Summary of Research Project Results Under the JSPS FY2000
"Research for the future Program"



1.Research Institution University of Tokyo
 
2.Research Area Physical and Engineering Science
 
3.Research Field Next-generation Process Technologies
 
4.Term of Project FY1996〜FY2000
 
5.Project Number 96P00402
 
6.Title of Project Control of Abnormal Structure Formation in Materials Processing

7.Projetct Leader
Name Institution,Department Title of Position
KOMIYAMA, Hiroshi Univ. of Tokyo, School of Engineering Professor

8.Core Members

Names Institution,Department Title of Position
OKUYAMA, Kikuo Hiroshima Univ., Faculty of Engineering Professor
MATSUKATA, Masahiko Waseda Univ., School of Science & Engineering Associate Professor
EGASHIRA, Yasuyuki Osaka Univ., School of Engineering Science Associate Professor

9.Cooperating Researchers

Names Institution,Department Title of Position
SHIMADA, Manabu Hiroshima Univ., Faculty of Engineering Associate Professor
HUNAKUBO, Hiroshi Tokyo Institute of Technology, School of Science & Engineering Associate Professor
NODA, Suguru Univ. of Tokyo, School of Engineering Associate Researcher

10.Summary of Research Results

Undesired structures often appears in materials processing, which we name as "abnormal growth." It is usually considered only as error and the enormous experimental facts are scattered and remain unutilized. Controlling the abnormal growth itself is very important. In addition, understanding its mechanisms will allow us the fundamental understanding of the morphology evolution, which is zoomed up in the abnormality. The purposes of this project are not only to make clear the growth mechanisms and the countermeasures of the abnormal growth, but also to establish the knowledge infrastructure of the morphology evolution in the materials processing.
First, we started with collecting the case studies, the number of which exceeded 700 at the end of the project. We extracted the typical cases through their classification and analysis, and carried out the several experimental and/or theoretical studies focused on them. We extracted the elements of the mechanisms, which we call process, and reconstructed the process models with them. Now that we can commonly treat the models, and put them in order into a directory structure. An computer simulator is also developed which can reproduce some of the structures, and linked to the process models. However, it is nearly impossible to complete this approach for all of the cases. In contrast, we can know the morphology for all of the cases by the electron micrographs. We thought out a "morphology space" composed of the axes on morphological characteristics, and succeeded to explain almost all of the morphologies. Since there can be found strong correlations between the processes and the morphologies, we can link them and the case studies together.
From the aspect of the "process- structure- function" relationship in materials processing, the above-mentioned is of the "process- structure (morphology)" relationship accompanied with the experimental facts. We implemented the knowledge into a system on the web "http://www.a-growth.t.u-tokyo.ac.jp "and published it, which will support not only solving the abnormal growth but also learning the materials processing.

11.Key Words

(1)materials processing、(2)abnormal growth、(3)knowledge infrastructure
(4)expert system、(5)experimental facts、(6)growth mechanisms
(7)countermeasures、(8)simulation、(9)morphology

12.References

[Reference Articles]
Author Title of Article
H. Komiyama Optimum Design Policy of Chemical Vapor Deposition Processes
Journal Volume Year Pages Concerned
Oyo Buturi(Japanese) 66 1997 1115-1119

Author Title of Article
M. Ishikawa Initial growth of chemical-vapor deposited SiO2
Journal Volume Year Pages Concerned
J. Appl. Phys. 82 1997 2655-2661

Author Title of Article
M. Ishikawa Observation of Initial Growth of SiO2 by Thermal Atmospheric Pressure CVD with TEOS/O3 by AFM/XPS and Morphological Change Mechanism
Journal Volume Year Pages Concerned
Kagaku-Kogaku-Ronbunshu (Japanese) 23 1997 644-651

Author Title of Article
E. Kikuchi Synthesis of a Zeolitic Thin Layer by a Vapor-phase Transport Method: Appearance of a Preferential Orientation of MFI Zeolite
Journal Volume Year Pages Concerned
Micropor. Mater. 11 1997 107-116

Author Title of Article
N. Nishiyama FER Membrane Synthesized by a Vapor-phase Transport Method: Its Structure and Separation Properties
Journal Volume Year Pages Concerned
Micropor. Mater. 12 1997 293-303

Author Title of Article
K. Okuyama Gas-Phase Nucleation in APCVD Thin Film Formation Process Using Tetraethylorthosilicate (TEOS)/O2 System
Journal Volume Year Pages Concerned
AIChE J. 43 1997 2688-2697

Author Title of Article
T. Seto Sintering of Polydisperse Nanometer-Sized Agglomerates
Journal Volume Year Pages Concerned
Aerosol Sci. Techn. 27 1997 422-438

Author Title of Article
T. Takahashi The Effects Gas-Phase Additives NH3, NO and NO2 on SiH4/O2 Chemical Vapor Deposition
Journal Volume Year Pages Concerned
J. Electrochem. Soc. 145 1998 1070-1075

Author Title of Article
D. Cheng Surface Protrusions of Chemical Vapor Deposited TiN Films Caused by Cu Contamination of Silicon Substrates
Journal Volume Year Pages Concerned
Jpn. J. Appl. Phys. 37 1998 L607-L609

Author Title of Article
K. Nishioka Growth mechanism of PbTiO3 films by metal organic chemical vapor deposition from Pb(DPM)2, Ti(DPM)2 (i-OPr)2 and O2
Journal Volume Year Pages Concerned
J. Mater. Sci. Lett. 17 1998 1653-1655

Author Title of Article
T. Takeuchi A Kinetic Study of the Chemical Vapor Deposition of Silicon Carbide from Dichlorodimethylsilane Precursors
Journal Volume Year Pages Concerned
J. Electrochem. Soc. 145 1998 1277-1284

Author Title of Article
P. R. H. Prasad Rao Synthesis of BEA by Dry Gel Conversion and Its Characterization
Journal Volume Year Pages Concerned
Micropor. and Mesopor. Mater. 21 1998 305-313

Author Title of Article
T. Seto Morphology and Electric Characteristic of Conductive Zinc Oxide Fine particles Generated by Aerosol Process
Journal Volume Year Pages Concerned
J. Aerosol Res., Japan (Japanese) 13 1998 337-342

Author Title of Article
H. Shirakawa Migration-coalescence of nanoparticles during deposition of Au, Ag, Cu, and GaAs on amorphous SiO2
Journal Volume Year Pages Concerned
J. Nanoparticle Research 1 1999 17-30

Author Title of Article
K. Tsukamoto Tetraethylorthosilicate Vapor Treatment for Eliminationg Surface Sensitivity in Tetraethylorthosilicatte/O3 Atmospheric-Pressure Chemical Vapor Deposition
Journal Volume Year Pages Concerned
Electrochem. Solid State Lett. 2 1999 24-26

Author Title of Article
K. Tsukamoto Morphology Evolution of SiO2 Films Deposited by Tetraethylorthosilicate/O3 Atmospheric-Pressure Chemical Vapor Deposition on Thermal SiO2
Journal Volume Year Pages Concerned
Jpn. J. Appl. Phys. 38 1999 L68-L70

Author Title of Article
D. Cheng Thermal desorption spectra of SiO2 films deposited on Si and on thermal SiO2 by tetraethylorthosilicate/O3 atmospheric-pressure chemical vapor deposition
Journal Volume Year Pages Concerned
J. Appl. Phys. 85 1999 7140-7145

Author Title of Article
T. Matsufuji Crystallization of FER on a Porous Alumina Support by a Vapor-phase Transport Method
Journal Volume Year Pages Concerned
Micropor. and Mesopor. Mater. 32 1999 159-168

Author Title of Article
M. Matsukata Conversion of Dry Gel to Microporous Crystals in Gas Phase
Journal Volume Year Pages Concerned
Topics in Catalysis 9 1999 77-92

Author Title of Article
T. Fujimoto, Effect of Cluster/Particle Deposition On Atmospheric Pressure Chemical Vapor Deposition of SiO2 from Four Gaseous Organic Si-Containing Precursors and Ozone
Journal Volume Year Pages Concerned
J. Appl. Phys. 85 1999 4196-4206

Author Title of Article
M. Adachi Control of Particle Generation in CVD Reactor by Ionization of Source Vapor
Journal Volume Year Pages Concerned
Kagaku-Kogaku-Ronbunshu (Japanese) 25 1999 878-883

Author Title of Article
M. Adachi Film Formation by Motion Control of Ionized Precursors in Electric Field
Journal Volume Year Pages Concerned
Appl. Phys. Lett. 75 1999 1973-1975

Author Title of Article
T. Oshika, Unveiling the Magic of H2S on the CVD-Al2O3 Coating
Journal Volume Year Pages Concerned
Joumal de Physique /V 9 1999 877-884

Author Title of Article
T. Matsuzaki Preparation and Characterization of Pb(Nb, Ti)O3 Thin Films by Metallorganic Chemical Vapor Deposition
Journal Volume Year Pages Concerned
J. Appl. Phys. 86 1999 4559-4564

Author Title of Article
K. Nishioka A Model for Predicting Preferential Orientation of Chemical-Vapor-Deposition Films
Journal Volume Year Pages Concerned
J. Electrochem. Soc. 147 2000 1440-1442

Author Title of Article
T. Matsufuji Synthesis and Permeation Studies of FER/Alumina Composite Membranes
Journal Volume Year Pages Concerned
Micropor. and Mesopor. Mater. 38 2000 43-50

Author Title of Article
T. Matsufuji Separation of Butane and Xylene Isomers with MFI-type Zeolitic Membranes Synthesized by a Vapor-phase Transport Method
Journal Volume Year Pages Concerned
J. Membr. Sci. 178 2000 25-34

Author Title of Article
X. Lin, Preparation of Mordenite membranes on a-Alumina Tubular Supports for Pervaporation of Water-Isopropyl Alcohol Mixtures
Journal Volume Year Pages Concerned
Chem. Comm.,   2000 957-958

Author Title of Article
M. Adachi Numerical Simulations of Films Formed by Cluster/Particle Co-Deposition in Atmospheric-Pressure Chemical Vapor Deposition Process Using Organic Silicon Vapors and Ozone Gas
Journal Volume Year Pages Concerned
Jpn. J. Appl. Phys. 39 2000 3542-3548

Author Title of Article
T. Fujimoto Particle Generation and Thin Film Surface Morphology in Tetraethyl-orthosilicate/Oxygen Plasma Enhanced Chemical Vapor Deposition Process
Journal Volume Year Pages Concerned
J. Appl. Phys. 88 2000 3047-3052

Author Title of Article
T. Watanabe Orientation Control of Metalorganic Chemical Vapor Deposition-Bi4Ti3O12 Thin Film by Sequential Source Gas Supply Method
Journal Volume Year Pages Concerned
Jpn. J. Appl. Phys. 39 2000 5211-5216

Author Title of Article
M. Aratani, Preparation of PbTiO3 Thin Films by Metalorganic Chemical Vapor Deposition and Their Characterization
Journal Volume Year Pages Concerned
Jpn. J. Appl. Phys. 39 2000 3591-3595

Author Title of Article
K. Nagashima Improvement of Property of Pb(ZrxTil-x)O3 Thin Film Preperd by Source Gas Pulse-Introduced Metalorganic Chemical Vapor Deposition
Journal Volume Year Pages Concerned
Jpn. J. Appl. Phys. 39 2000 L996-L998

Author Title of Article
S. Takami, Computational Chemistry Study on Initial Stages of Nitridation of Silicon Surfaces
Journal Volume Year Pages Concerned
Jpn. J. Appl. Phys. 39 2000 4443-4446

Author Title of Article
X-D. Liu Influence of Deposition Temperature on the Microstructure of Pb-Ti-Nb-O Thin Films by Metallorganic Chemical Vapor Deposition
Journal Volume Year Pages Concerned
J. Electrochem. Soc. 148 2001 C227-C230

Author Title of Article
M. Aratani Low Temperature Deposition of Pb(Zr, Ti)O3 Film by Source Gas Pulse-Introduced Metalorganic Chemical Vapor Deposition
Journal Volume Year Pages Concerned
Jpn. J. Appl. Phys. 40 2001 L1-L3

Author Title of Article
K. Tokita Dependence of Crystallorgaphic Orientation for Rhombohedral PZT Thin Films on Their Electrical Properties
Journal Volume Year Pages Concerned
Ferroelectrics   2001 (inPress)

[Reference Books]
Author Title of Book
Edited by H. Tominaga Chemical Reaction and Reactor Design
Publisher Year Pages
Wiley and Maruzen 1997 403

Author Title of Book
Edited by Soc. Chem. Eng. Jpn. Advances in Recent Chemical Engineering 49 The state of the art in membrane technology and its prospects
Publisher Year Pages
Kagaku Kogyo Sha Pub. 1997 153

Author Title of Book
Edited by Catalysis Soc. Jpn. The state of the art in catalysis and its prospects 1998
Publisher Year Pages
Catalysis Soc. Jpn 1998 376


back